Physics and Astronomy · MapleScholar Plus

The Atomic Mirror Telescope: How a 1989 Japanese Paper Made Modern Microchips Possible

Traditional optical chipmaking lenses become completely opaque to deep ultraviolet wavelengths; Hiroo Kinoshita carved microchip circuits using extreme ultraviolet soft X-rays reflected off atomic-precision multilayer mirrors. Published in 1989 when the industry deemed X-ray lithography an impossible fantasy, Kinoshita’s experimental setup became the physical foundation of the multi-billion-dollar ASML EUV machines that print the world's most advanced computer chips.

Author
Hiroo Kinoshita et al.
Published
1989
Journal
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
Last updated
September 2026
The Atomic Mirror Telescope: How a 1989 Japanese Paper Made Modern Microchips Possible

In semiconductor fabrication, printing smaller transistors requires shining light with smaller wavelengths through glass lenses. However, as wavelengths approached extreme ultraviolet, a physical wall was hit: glass lenses absorbed the light like concrete, making traditional camera optics useless.

Japanese physicist Hiroo Kinoshita realized that instead of shining light through glass lenses, chipmakers had to bounce soft X-rays off ultra-smooth atomic mirrors in a total vacuum. By coating mirrors with alternating layers of molybdenum and silicon, his team created an atomic telescope capable of focusing 13.5-nanometer light onto silicon.

Dormant for three decades while the industry stretched immersion lithography to its limits, Kinoshita's mirror design now powers the global microchip supply chain. By printing the world's fastest two-nanometer AI processors, by enabling ASML’s $300-million lithography machines, and by driving global technology geopolitics, EUV mirror physics shapes human civilization.

Reference

Kinoshita, H., Kurihara, K., Ishii, Y., & Torii, Y. (1989). Soft x-ray reduction lithography using multilayer mirrors. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 7(6), 1648–1651.

Title

Soft x-ray reduction lithography using multilayer mirrors

Abstract

A soft x-ray lithograpy using multilayer mirrors for demagnifying optics and a reflecting mask has been designed and studied experimentally. In this system, a wavelength of 45–130 Å has been selected based on the optical characteristics, the exposed depth of the resist film, and the reflectivity of the multilayer mirror. To obtain a replication pattern resolution of 0.2 μm, the numerical aperture required is estimated to be greater than 0.0125 or 0.0325 for a wavelength of 50 or 130 Å, respectively. These values show that the multilayer optics using two mirrors can be realized to replicate a 0.2 μm pattern. The experiments were performed on the SR beamline BL-1 of the KEK-PF storage ring. The Schwarzschild demagnifying optics with a ring field were designed and fabricated. Demagnified exposure patterns of less than 0.5 μm have been obtained using a reflecting mask. The feasibility of the soft x-ray reduction method using multilayer mirrors has been confirmed. Furthermore, new telecentric optics are proposed to realize a practical reduction lithography system.

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